The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Jun. 25, 2024
Disco Corporation, Tokyo, JP;
DISCO CORPORATION, Tokyo, JP;
Abstract
A polishing method for a gallium nitride wafer includes a holding step of holding a first surface side of the gallium nitride wafer by a holding table, and a polishing step of polishing the gallium nitride wafer while supplying a polishing liquid to an area between a polishing pad and the gallium nitride wafer in a state in which the polishing pad is in contact with a second surface located on a side opposite to the first surface side of the gallium nitride wafer held by the holding table. The polishing liquid contains dissolved therein permanganate and a water-soluble ionic compound including one of or both nitrate ions and cerium(IV) ions.
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