The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Nov. 14, 2024
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Takafumi Nogami, Nirasaki, JP;
Kenichi Kote, Nirasaki, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32266 (2013.01); H01J 37/32201 (2013.01); H01J 37/32302 (2013.01);
Abstract
A method of modifying a film formed on a substrate, includes: generating plasma by a microwave in an interior of a processing container in which a stage on which a substrate is placed is provided; and periodically applying a DC voltage to the stage in the interior of the processing container in which the plasma is generated by the generating the plasma, and irradiating the substrate with electrons in the plasma.
Nogami, Takafumi. (2026). Modification method and modification device (U.S. Patent No. 12755941). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12755941
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile