The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Sep. 29, 2023
Fei Company, Hillsboro, OR (US);
Alexander Henstra, Utrecht, NL;
Abstract
Aberration correction systems and charged particle microscope systems including the same. An apparatus can include a plurality of electrostatic multipole elements configured to at least partially correct an axial chromatic aberration of the charged particle beam. The apparatus additionally includes a deflector assembly with a corrector electrostatic prism. The corrector electrostatic prism can include a first corrector prism electrode and a second corrector prism electrode that define an electrode gap therebetween and a deflector optical axis extends within the electrode gap. The plurality of electrostatic multipole elements can include a first hexapole-generating element, a second hexapole-generating element, a third hexapole-generating element, and/or a fourth hexapole-generating element. In some examples, the second hexapole-generating element is positioned proximate to a midpoint of the deflector optical axis. In some examples, each of the second hexapole-generating element and the third hexapole-generating element is positioned at least partially within the corrector electrostatic prism.