The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2026

Filed:

Apr. 18, 2024
Applicant:

Contemporary Amperex Technology (Hong Kong) Limited, Hong Kong, CN;

Inventors:

Yongfa Liu, Ningde, CN;

Guannan Jiang, Ningde, CN;

Annan Shu, Ningde, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06V 10/75 (2022.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01);
Abstract

A method and a device for defect detection are provided. The method includes: obtaining a defect eigenvector of an image to be detected; calculating a similarity score of the image to be detected for each known defect type according to the defect eigenvector; and performing defect classification on the image to be detected according to the similarity score. The similarity score between the defect eigenvector of the image to be detected and each known defect type is calculated, and then it is possible to distinguish known defects from unknown defects and accurately classify the known defects according to the similarity scores, so as to effectively detect the defects.


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Liu, Yongfa. (2026). Method and device for defect detection (U.S. Patent No. 12755373). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12755373

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