The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2026

Filed:

Mar. 03, 2023
Applicant:

Kioxia Corporation, Tokyo, JP;

Inventor:

Anupam Mitra, Yokkaichi Mie, JP;

Assignee:

Kioxia Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01); G03F 7/00 (2006.01); H10P 76/20 (2026.01);
U.S. Cl.
CPC ...
G03F 9/7042 (2013.01); G03F 7/0002 (2013.01); H10P 76/2041 (2026.01);
Abstract

According to one embodiment, a pattern forming method includes placing a resin material on a film to be processed; pressing a template including a plurality of patterns protruding from a reference plane against the resin material to form a first resin film having first and second patterns, separated from each other in a first direction, and a third pattern between the first and second patterns; forming a second resin film that covers the first resin film; selectively exposing and developing the second resin film to expose the first and second patterns; and processing the film to be processed via the first and second resin films to transfer the first and second patterns to the film to be processed.


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