The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2026

Filed:

Jun. 27, 2023
Applicant:

Applied Materials Israel Ltd., Rehovot, IL;

Inventors:

Ilan Ben-Harush, Tel-Aviv, IL;

Rafael Bistritzer, Petach Tikva, IL;

Yehoshua Cohen, Tel-Aviv, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 18/2111 (2023.01); G03F 7/00 (2006.01); G06F 30/27 (2020.01); G06F 30/398 (2020.01); G06F 119/02 (2020.01); G06F 119/18 (2020.01); G06F 119/20 (2020.01); G06F 119/22 (2020.01);
U.S. Cl.
CPC ...
G03F 7/706841 (2023.05); G03F 7/706837 (2023.05); G03F 7/706843 (2023.05); G06F 18/2111 (2023.01); G06F 30/27 (2020.01); G06F 30/398 (2020.01); G06F 2119/02 (2020.01); G06F 2119/18 (2020.01); G06F 2119/20 (2020.01); G06F 2119/22 (2020.01);
Abstract

There is provided a system and method for examining a semiconductor specimen. The method includes obtaining a runtime image of a semiconductor specimen acquired by an examination tool; processing the runtime image to create one or more image strips each containing an edge, and for each image strip, extracting a sequence of topo points representative of a contour of the edge therein; providing the sequence of topo points for each image strip to a trained machine learning (ML) model to be processed, and obtaining, as an output of the ML model, a sequence of updated topo points; and obtaining measurement data on the runtime image using the sequence of updated topo points, wherein the measurement data has improved performance with respect to at least one metrology metric.


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