The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Jun. 21, 2024
Shandong University, Jinan, CN;
Jiawei Zhang, Jinan, CN;
Baoqing Zhang, Jinan, CN;
Aimin Song, Jinan, CN;
Zihao Zhang, Jinan, CN;
Hu Li, Jinan, CN;
SHANDONG UNIVERSITY, Jinan, CN;
Abstract
The present invention discloses a method and system for determining a key dimension of a low-dimensional material by optical scattering. The method includes: controlling a light source to be obliquely incident onto a low-dimensional material to be observed and a substrate at a set angle, wherein the set angle is able to enable a light receiving device located above or below the low-dimensional material to only receive light scattered by the low-dimensional material; converting the received scattered light into an optical image; obtaining a brightness value of each pixel in the optical image, and establishing a correspondence relationship between a position and brightness; calculating a contrast based on the correspondence relationship between the position and the brightness, and determining the key dimension of the low-dimensional material based on a pre-calibrated correspondence relationship between the contrast and the key dimension of the low-dimensional material.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile