The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
May. 10, 2023
Hach Lange Gmbh, Berlin, DE;
HACH LANGE GMBH, Berlin, DE;
Abstract
The invention refers to a photometric process measurement arrangement () with a photometric immersion probe (). The photometric immersion probe () comprises a photometer flashlight source () for providing photometric light impulses, a photometric detector arrangement () comprising at least two separate wavelength-selective detection elements (), and a photometer control () controlling the photometer flashlight source () and the detector arrangement (). The photometer control () comprises several impulse signal integrators () for integrating the electric impulses generated by the detection elements (), several A/D-converters () for converting the voltages of the impulse signal integrators () when high-precision-converting trigger ports (H) of the A/D-converters () are triggered, and a measuring cycle control () with an integration target memory () memorizing an integration target voltage value (Ut). The photometer control () is provided with a high-precision-request port () for synchronously triggering the high-precision-converting trigger ports (H) of all A/D-converters () after the voltage of the first of all impulse signal integrators () has exceeded the memorized integration target voltage value (Ut).