The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Sep. 19, 2022
Advanced Micro-fabrication Equipment Inc. China, Shanghai, CN;
Gerald Zheyao Yin, Shanghai, CN;
Hailong Zhang, Shanghai, CN;
Yunling Pang, Shanghai, CN;
Hai Cong, Shanghai, CN;
ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA, Shanghai, CN;
Abstract
The present application discloses a chemical vapor deposition equipment and method therefor, the equipment including: a reaction chamber; an outer housing provided outside the reaction chamber, an accommodation space being formed between the outer housing and the reaction chamber; a plurality of radiant heat sources provided in the accommodation space; and pressure adjusting device used for independently regulating the pressure in the reaction chamber and the accommodation space. Advantages thereof are as follows: the pressure of the accommodation space of the equipment is smaller than the atmospheric pressure, which helps to reduce the pressure on the wall of the reaction chamber while not affecting the heat transfer efficiency of the radiant heat sources, thereby contributing to the uniform heating of the reaction area in the reaction chamber, and improving the yield rate of substrate process production.