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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12753507 B1

PDFFull Text
Date of Patent:
Oct. 06, 2026

Filed:

Aug. 18, 2022

Substrate processing apparatus

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Tatsuya Yamaguchi, Nirasaki City, JP;

Syuji Nozawa, Nirasaki City, JP;

Assignee:

Tokyo Electron Limited, Tokyo, JP;

Attorney:

Armstrong Teasdale LLP

Primary Examiner:

Gordon Baldwin

Assistant Examiner:

Todd M Seoane

Int. Cl.
CPC ...
C23C 16/458 (2006.01); B05D 1/00 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/505 (2006.01); H01J 37/32 (2006.01); H10P 72/76 (2026.01);
U.S. Cl.
CPC ...
C23C 16/4585 (2013.01); B05D 1/60 (2013.01); C23C 16/4412 (2013.01); H01J 37/32715 (2013.01); H10P 72/7611 (2026.01); B05D 2401/33 (2013.01); C23C 16/45565 (2013.01); C23C 16/505 (2013.01);
Abstract

A substrate processing apparatus including: a processing container; a stage installed in the processing container and configured to place a substrate thereon; a ceiling plate installed at a position facing the stage in the processing container; a driver configured to raise and lower the stage; an exhaust port formed in a side wall of the processing container and configured to exhaust a gas in the processing container; and a controller configured to control conductance of a space between the exhaust port and a processing space between the stage and the ceiling plate by controlling the driver to adjust a distance between a peripheral edge portion of the stage and a facing member disposed at a position facing the peripheral edge portion in the processing container.

Find Patent Forward Citations

Yamaguchi, Tatsuya. (2026). Substrate processing apparatus (U.S. Patent No. 12753507). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12753507

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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