The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2026

Filed:

Jun. 20, 2024
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Dieter Pierreux, Pepingen, BE;

Quentin Nikitas Nicolas Lionel Eric Tricas, Schaerbeek, BE;

Werner Knaepen, Leuven, BE;

Alessandro Viva, Leuven, BE;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/44 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45529 (2013.01); C23C 16/4408 (2013.01); C23C 16/45553 (2013.01); C23C 16/52 (2013.01);
Abstract

A method of forming a layer of a material on one or more substrates by ALD is disclosed. Embodiments of the presently described method comprise performing a plurality of deposition cycles comprising at least two precursors pulses with intervening purge pulses to form the layer of the material on the one or more substrates. During each deposition cycle, a ratio of the process chamber pressure during each precursor pulse of the at least two precursor pulses to the process chamber pressure during an intervening purge pulse is equal or different from one another.


Find Patent Forward Citations

Pierreux, Dieter. (2026). Method of forming a layer by ald (U.S. Patent No. 12753497). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12753497

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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