The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2026
Filed:
Feb. 16, 2023
Tokyo Electron Limited, Tokyo, JP;
Yohei Yamazawa, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A plasma processing apparatus is provided. The apparatus comprises: a chamber accommodating a substrate; a window member forming an upper portion of the chamber; a gas inlet port disposed in at least one of a sidewall of the chamber and the window member, and configured to supply a gas into the chamber; and an antenna disposed above the chamber with the window member interposed therebetween, having a linear shape and made of a conductive material, and configured to produce plasma from the gas supplied into the chamber by radiating a radio frequency (RF) power into the chamber. The antenna includes: a first coil to which the RF power is supplied; and a plurality of second coils formed in the same shape and arranged around the first coil to be rotationally symmetrical with respect to a central axis of the first coil. One ends of the second coils are connected one-to-one to variable capacitors.