The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 29, 2026

Filed:

Feb. 14, 2024
Applicant:

Disco Corporation, Tokyo, JP;

Inventor:

Van Tuan Dang, Tokyo, JP;

Assignee:

DISCO CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F 1/42 (2023.01); C02F 103/04 (2006.01);
U.S. Cl.
CPC ...
C02F 1/42 (2013.01); C02F 2103/04 (2013.01); C02F 2307/00 (2013.01);
Abstract

A water supply system for supplying water to be used in a processing apparatus includes a water producing apparatus and a water adjusting apparatus. The water producing apparatus includes a first ion exchange resin column containing first ion exchange resin with which the water makes contact, and a first specific resistance meter for measuring a specific resistance of the water having made contact with the first ion exchange resin. The water adjusting apparatus includes a second ion exchange resin column containing second ion exchange resin with which the water supplied from the water producing apparatus makes contact, and a second specific resistance meter for measuring a specific resistance of the water having made contact with the second ion exchange resin.


Find Patent Forward Citations

Dang, Van. (2026). Water supply system (U.S. Patent No. 12747170). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12747170

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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