The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2026
Filed:
Oct. 26, 2023
Tokyo Electron Limited, Tokyo, JP;
Kiyoshi Mori, Tokyo, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A method of measuring a positional deviation of a substrate stage in a substrate processing apparatus provided rotatably inside a processing container, includes: detecting an initial position of a substrate transferred by an arm that transfers the substrate; placing the substrate on the substrate stage; rotating the substrate by a predetermined rotational angle by rotating the substrate stage; delivering the substrate after rotation from the substrate stage to the arm; detecting a position of the substrate after rotation transferred by the arm; and calculating the positional deviation amount of the substrate stage with respect to the initial position of the substrate based on the initial position of the substrate, the position of the substrate after rotation, and the rotational angle.