The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2026
Filed:
Nov. 12, 2021
Applicant:
Massachusetts Institute of Technology, Cambridge, MA (US);
Inventors:
David L. Trumper, Plaistow, NH (US);
Brij Mohan Bhushan, Norwalk, CT (US);
Assignee:
Massachusetts Institute of Technology, Cambridge, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 72/00 (2026.01); B65G 47/92 (2006.01); G03F 7/00 (2006.01); H10P 72/50 (2026.01); H10P 72/72 (2026.01);
U.S. Cl.
CPC ...
H10P 72/0606 (2026.01); B65G 47/92 (2013.01); G03F 7/70708 (2013.01); G03F 7/70741 (2013.01); H10P 72/50 (2026.01); H10P 72/722 (2026.01);
Abstract
An electrostatic chuck includes electrodes to clamp a workpiece, electrodes to electrostatically levitate and position the workpiece, and sensors to detect position and orientation of the workpiece. Lateral motion of the workpiece relative to the electrostatic chuck can be damped prior to clamping.
Trumper, David. (2026). Reticle exchange device with reticle levitation (U.S. Patent No. 12745594). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12745594
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile