The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2026
Filed:
Dec. 04, 2024
Tokyo Electron Limited, Tokyo, JP;
Shuto Watanabe, Yamanashi, JP;
Yuki Osada, Yamanashi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma processing apparatus comprises a processing chamber configured to form a processing space, an application electrode disposed on one side of the processing space and connected to a high-frequency power supply, a counter electrode disposed on the other side of the processing space, and a phase control circuit configured to include a semiconductor switch and connected to the counter electrode. An ON signal shorter than one cycle of a high-frequency signal outputted from the high-frequency power supply, which is a control signal, is inputted to the semiconductor switch in synchronization with the frequency of the high-frequency signal.