The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2026
Filed:
Sep. 15, 2023
Unitx, Inc., Santa Clara, CA (US);
Tommy Liu, Santa Clara, CA (US);
Killian Weber, Santa Clara, CA (US);
Roman Balak, San Jose, CA (US);
Hill MA, Santa Clara, CA (US);
UnitX, Inc., Santa Clara, CA (US);
Abstract
In an example embodiment, a uniform filtering technique is applied using photometric stereo to reduce or eliminate global defects in a scanned component. An image is taken of a component using a photometric stereo technique. A uniform filter then, for every point in the component, takes an average of heights of the points near it. This essentially 'blurs' the image. The blurring may be repeated multiple times. The blurred image may then be subtracted from the original image, essentially flattening out the image in a manner that reduces or eliminated global inaccuracies. The post-filtered image can then be used for defect detection, with that defect detection being more accurate because of the reduction of the global inaccuracies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile