The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2026
Filed:
Mar. 14, 2023
Asml Netherlands B.v., Veldhoven, NL;
Hans Butler, Best, NL;
Marinus Petrus Reijnders, Eindhoven, NL;
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of spatially aligning a patterning device and a substrate, wherein the patterning device and the substrate are separated by an optical path comprising one or more moveable optical components is described, the method comprising: —performing a plurality of alignment measurements, wherein for each alignment measurement the moveable optical components are arranged in respective predetermined positions, —combining the alignment measurements, and —spatially aligning the patterning device and the substrate based on the combination of the alignment measurements.