Method for scanning field correction at least of a laser scanner device, laser scanner device, scatter pattern element, scatter pattern holding device and scanning field correction system

Abstract

The invention relates to a method for scanning field correction at least of a laser scanner device (), wherein the method comprises the following steps: —providing a scatter pattern element () on a processing plane (), wherein the scatter pattern element () comprises at least one scatter region () which is arranged in a scatter pattern (M); —passing over or scanning at least one part of the scatter pattern element () on the processing plane () by means of a laser beam () of the at least one laser scanner device () along scanner coordinates (x, y, z), wherein the laser beam passes through at least one window (), preferably protective glass, between a deflection unit () and the processing plane (); —detecting scatter radiation () which can be generated by scattering and/or reflection of the laser beam () when passing over or scanning the at least one scatter region (); —creating a contour diagram (K) by correlating the detected scatter radiation () with the scanner coordinates (x, y, z); —comparing the contour diagram (K) with a reference image of the scatter pattern (M) and determining a deviation of the contour diagram (K) from the reference image of the scatter pattern (M); —calculating a calibration function for calibrated control of the deflection unit () on the basis of the determined deviation.