The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2026
Filed:
Feb. 04, 2021
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Jeffrey Womack, Lake Oswego, OR (US);
Karl Frederick Leeser, West Linn, OR (US);
Curtis W. Bailey, West Linn, OR (US);
Keith Joseph Martin, Tualatin, OR (US);
Rigel Martin Bruening, Sherwood, OR (US);
Nick Ray Linebarger, Jr., Beaverton, OR (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/44 (2006.01); C23C 16/505 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32477 (2013.01); C23C 16/4404 (2013.01); C23C 16/505 (2013.01); C23C 16/52 (2013.01); H01J 37/32183 (2013.01); H01J 37/32449 (2013.01); H01J 2237/3321 (2013.01);
Abstract
A reactor system comprises a process chamber, a gas inlet, and a dispenser. The dispenser is coupled to the gas inlet. The dispenser controls a gas flow from a vial to the gas inlet. The vial includes a coating material that, when released inside the process chamber under operating conditions of the reaction system, coats an inner wall of the process chamber.