The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2026

Filed:

Nov. 29, 2022
Applicant:

Asm Ip Holding, B.v., Almere, NL;

Inventor:

Antti Niskanen, Helsinki, FI;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3244 (2013.01); C23C 16/45536 (2013.01); C23C 16/45544 (2013.01); C23C 16/45565 (2013.01); C23C 16/4584 (2013.01); H01J 37/32715 (2013.01); H01J 2237/3321 (2013.01); H01J 2237/3341 (2013.01);
Abstract

The current disclosure relates to a semiconductor processing chamber comprising a showerhead, the showerhead comprising a showerplate for providing a reactant into the processing chamber. The processing chamber further comprises a moveable susceptor for holding a substrate; wherein the processing chamber has a showerplate axis extending vertically through the showerplate; a substrate axis extending vertically at a position at which the center of the substrate is configured and arranged to be during providing reactant into the processing chamber; and wherein the substrate axis is offset from the showerhead axis. The disclosure further relates to a semiconductor processing assembly and to a method of treating a semiconductor substrate.


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