The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 2026
Filed:
Nov. 11, 2022
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
Rudolf Geurink, Sint-Michielsgestel, NL;
Hugo Cornelis Van Leeuwen, Eindhoven, NL;
Gerard Nicolass Anne Van Veen, Riethoven, NL;
Pleun Dona, Veldhoven, NL;
Stephan Kujawa, Veldhoven, NL;
Maarten Bischoff, Uden, NL;
Assignee:
FEI Company, Hillsboro, OR (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/18 (2006.01); H01J 37/20 (2006.01); H01J 37/22 (2006.01); H01J 37/244 (2006.01); H01J 37/26 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/18 (2013.01); H01J 37/20 (2013.01); H01J 37/226 (2013.01); H01J 37/244 (2013.01); H01J 37/265 (2013.01); H01J 37/28 (2013.01); H01J 2237/2802 (2013.01);
Abstract
The present disclosure relates to a charged particle microscope in which in-situ thermal laser epitaxy can be performed and the product analysed, methods of performing in-situ thermal laser epitaxy and analysis within the charged particle microscope and the combination of at least one cartridge and a laser for use in a charged-particle microscope to provide in-situ thermal laser epitaxy and analysis are also described.