The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2026

Filed:

Oct. 18, 2023
Applicant:

Veeco Instruments Inc., Plainview, NY (US);

Inventor:

Ji-Dih Hu, San Jose, CA (US);

Assignee:

VEECO INSTRUMENTS INC., Plainview, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 5/0821 (2022.01); G01J 5/0818 (2022.01);
U.S. Cl.
CPC ...
G01J 5/0821 (2013.01); G01J 5/0818 (2013.01);
Abstract

A substrate processing system in accordance with one embodiment includes a processing chamber and an optical pyrometer assembly to measure an emitted thermal radiation originating substantially from a portion of target surfaces. The optical pyrometer includes a lightpipe that comprises a core and a hollow sheath surrounding the core. The core and the sheath are concentric with one another. The sheath is formed by a chemical vapor deposition process and includes local protrusions within a hollow interior thereof to maintain a position of the core within the sheath. In particular, the local protrusions are formed so as to center at least a distal end portion of the core within the sheath. A temperature of the target surface is determined from an intensity of a portion of the emitted thermal radiation near at least one wavelength.


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