The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2026

Filed:

Dec. 14, 2021
Applicant:

Tokyo Seimitsu Co., Ltd., Hachioji, JP;

Inventor:

Junichi Fukushima, Hachioji, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B08B 1/12 (2024.01); B08B 1/16 (2024.01); B08B 3/02 (2006.01);
U.S. Cl.
CPC ...
B08B 1/12 (2024.01); B08B 1/165 (2024.01); B08B 3/02 (2013.01);
Abstract

A cleaning device for a wafer-suction chuck mechanism capable of automatically and simply performing cleaning treatment on a chuck surface that suction-holds a wafer and cleaning treatment on a frame suction-holding section. The cleaning device is configured to include a scraperand a brushthat press frame suction-holding section cleaning meansB for removing a sludge on a frame suction-holding sectionB onto the frame suction-holding sectionB, and a water nozzlethat discharges and supplies water onto the frame suction-holding sectionB.


Find Patent Forward Citations

Fukushima, Junichi. (2026). Cleaning device for wafer-suction chuck mechanism (U.S. Patent No. 12734555). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12734555

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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