The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2026
Filed:
Mar. 10, 2023
Georgia Tech Research Corporation, Atlanta, GA (US);
Pratik Nimbalkar, Atlanta, GA (US);
Mohanalingam Kathaperumal, Atlanta, GA (US);
Madhavan Swaminathan, Atlanta, GA (US);
Rao R. Tummala, Atlanta, GA (US);
Georgia Tech Research Corporation, Atlanta, GA (US);
Abstract
Disclosed herein are methods for etch barrier deposition that can include depositing a seed layer onto a substrate, depositing a metal layer onto the seed layer in a predetermined pattern, coating the metal layer with a barrier layer, directionally etching the barrier layer from a direction orthogonal to the substrate such that at least a portion of the barrier layer oriented parallel to the direction of the directional etching remains coated on the metal layer, and etching the portion of the seed layer to remove the seed layer from the substrate.