The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2026

Filed:

Apr. 26, 2024
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Shigeru Yamamoto, Kyoto, JP;

Yasuhiko Nagai, Kyoto, JP;

Keiji Iwata, Kyoto, JP;

Takashi Akiyama, Kyoto, JP;

Akira Ito, Kyoto, JP;

Daiki Fujii, Kyoto, JP;

Kazuki Goda, Kyoto, JP;

Yosuke Nishino, Kyoto, JP;

Yuya Kawai, Kyoto, JP;

Kenji Edamitsu, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10P 72/00 (2026.01); B08B 3/14 (2006.01);
U.S. Cl.
CPC ...
H10P 72/0414 (2026.01); B08B 3/14 (2013.01); H10P 72/0402 (2026.01); H10P 72/0404 (2026.01); H10P 72/0448 (2026.01);
Abstract

Provided is a substrate treating apparatus for treating a substrate. The substrate treating apparatus includes a substrate treating unit configured to supply a water-insoluble water repellent to the substrate to perform water-repellent treatment to the substrate, a decomposition solution mixing mechanism configured to mix a decomposition solution for decomposing the water repellent to a water repellent-containing liquid that contains the water repellent as a waste liquid generated through the water-repellent treatment of the substrate, and a discharging unit configured to discharge a mixed liquid of the water repellent-containing liquid and the decomposition solution to an outside of the substrate treating apparatus.


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