The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2026

Filed:

Jul. 26, 2023
Applicant:

Nec Laboratories America, Inc., Princeton, NJ (US);

Inventors:

Yanchi Liu, Monmouth Junction, NJ (US);

Haifeng Chen, West Windsor, NJ (US);

Yufei Li, Monmouth Junction, NJ (US);

Assignee:

NEC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04L 9/40 (2022.01); H04L 41/16 (2022.01);
U.S. Cl.
CPC ...
H04L 63/1425 (2013.01); H04L 41/16 (2013.01);
Abstract

A computer-implemented method for employing a graph-based log anomaly detection framework to detect relational anomalies in system logs is provided. The method includes collecting log events from systems or applications or sensors or instruments, constructing dynamic graphs to describe relationships among the log events and log fields by using a sliding window with a fixed time interval to snapshot a batch of the log events, capturing sequential patterns by employing temporal-attentive transformers to learn temporal dependencies within the sequential patterns, and detecting anomalous patterns in the log events based on relationships between the log events and temporal context determined from the temporal-attentive transformers.


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