The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2026
Filed:
Dec. 11, 2024
Nec Laboratories America, Inc., Princeton, NJ (US);
Zhengzhang Chen, Princeton Junction, NJ (US);
Haifeng Chen, West Windsor, NJ (US);
Yanchi Liu, Princeton, NJ (US);
Luan Tang, Cranbury, NJ (US);
Haoyu Wang, Plainsboro, NJ (US);
Dongjie Wang, Orlando, FL (US);
NEC Corporation, Tokyo, JP;
Abstract
Methods and systems for root cause analysis include combining system logs and system metrics into time-series data. Individual root cause analysis is performed to determine individual causal scores for respective system entities. Topological root cause analysis is performed to capture topological patterns of system anomalies. The individual causal scores and the topological patterns are integrated by a weighted sum. A corrective action is performed on an entity identified based on the weighted sum.