Composition for forming organic film, patterning process, and compound and polymer for forming organic film

Abstract

An organic film forming composition, containing: a material shown by formula (I) and/or (II); and an organic solvent, where Rand Reach represent a hydrogen atom, an allyl or propargyl group, Rand Reach represent a substituent, Rand Rrepresents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkynyl group having 2 to 4 carbon atoms, or an alkenyl group having 2 to 4 carbon atoms. 'm' and “i” represent 0 or 1, “k” and “q” represent an integer of 0 to 2, “n” represent 1 or 2, “h”, and “j” represent an integer of 0 to 2 and satisfy the relationship 1≤h+j≤4, and “l” and “r” represent 0 or 1. W represents a single bond or divalent group shown by formulae (3). Each V independently represents a hydrogen atom or linking moiety.