The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2026
Filed:
May. 13, 2024
Auros Technology, Inc., Hwaseong-si, KR;
Seong Yun Choi, Osan-si, KR;
Sun Gyun Kim, Seoul, KR;
AUROS Technology, Inc., Hwaseong-si, KR;
Abstract
Disclosed is a system for optimizing a measurement time of an overlay. According to one embodiment, an overlay measurement apparatus is provided. The overlay measurement apparatus includes a light source configured to direct light to a plurality of overlay targets formed on a wafer; a lens unit including: an objective lens and a lens focus actuator; a detector configured to acquire a focus image; a stage on which the wafer is seated; and a controller configured to: control the lens unit, the detector, and the stage to measure a preset collection-purposed overlay target; collect a target coordinate of the collection-purposed overlay target; calculate a correction value based on the target coordinate; move the stage under application of the correction value; and control the lens unit, the detector, and the stage to measure at least one application-purposed overlay target.