The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2026
Filed:
Apr. 16, 2024
Wonik Qnc Corporation, Gumi-si, KR;
Eun Young Choi, Hwaseong-si, KR;
Sang Hyun Cho, Suwon-si, KR;
Seung Jin Jung, Seoul, KR;
Joo Hee Jang, Hwaseong-si, KR;
So Young Choi, Anseong-si, KR;
Dong Ho Shin, Seoul, KR;
Jong Hwan Mun, Anseong-si, KR;
Min Seob Jung, Seoul, KR;
WONIK QNC CORPORATION, Gumi-si, KR;
Abstract
Provided is a method and an apparatus for dry-cleaning an aluminum nitride (AlN) heater for semiconductor fabrication equipment, which may efficiently remove fluorine-containing contaminants generated on the AlN heater during semiconductor fabrication processes, and especially, may effectively and simultaneously remove organic, inorganic metallic, and inorganic contaminants. The method for dry-cleaning an AlN heater for semiconductor fabrication equipment includes steps of: determining a laser to be used for the AlN heater; determining laser control factors required for cleaning the AlN heater with respect to the laser to be used determined in the step of determining the laser to be used; and cleaning the AlN heater by laser irradiation based on the laser control factors determined in the step of determining the laser control factors.