The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2026
Filed:
Feb. 28, 2024
Tokyo Electron Limited, Tokyo, JP;
Jun Shinagawa, Fremont, CA (US);
Barton Lane, Austin, TX (US);
Merritt Funk, Austin, TX (US);
Shinichi Kozuka, Hillsboro, OR (US);
Masashi Kanda, Hillsboro, OR (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method of chamber matching is provided. A first virtual metrology (VM) model is configured to predict a first thickness change rate (TCR) for executing a plasma recipe in a first chamber. A second VM model is configured to predict a second TCR for executing the plasma recipe in a second chamber. The plasma recipe includes one or more inert gases and no reactive gases. A control model describes relationships between voltage, current and recipe parameters. In reference to a first voltage in the first chamber measured by a first radio frequency (RF) sensor, a second voltage in the second chamber measured by a second RF sensor is calibrated. In reference to a first current in the first chamber measured by the first RF sensor, a second current in the second chamber measured by the second RF sensor is calibrated.