The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2026
Filed:
Jul. 01, 2022
Applicant:
SK Enpulse Co., Ltd., Gyeonggi-do, KR;
Inventors:
Sung Hoon Yun, Seoul, KR;
Jang Won Seo, Seoul, KR;
Hye Young Heo, Gyeonggi-do, KR;
Jong Wook Yun, Seoul, KR;
Jae In Ahn, Gyeonggi-do, KR;
Assignee:
ENPULSE CO., LTD., Chungcheongnam-do, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 37/24 (2012.01); B24B 37/20 (2012.01); B24B 37/22 (2012.01); B24B 37/26 (2012.01);
U.S. Cl.
CPC ...
B24B 37/24 (2013.01); B24B 37/205 (2013.01); B24B 37/22 (2013.01); B24B 37/26 (2013.01);
Abstract
Provided are a polishing pad provided with a structural feature capable of maximizing the leakage prevention effect, the polishing pad including: a polishing layer including a first surface which is a polishing surface and a second surface which is an opposite surface thereof, and including a first through hole passing through the first surface and the second surface; a window disposed in the first through hole; and a support layer disposed at the second surface of the polishing layer.