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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12720961 B1

PDFFull Text
Date of Patent:
Aug. 25, 2026

Filed:

Dec. 27, 2021

Method of fabricating display device using sacrificial film

Applicant:

Semiconductor Energy Laboratory Co., Ltd., Atsugi, JP;

Inventors:

Shunpei Yamazaki, Tokyo, JP;

Kenichi Okazaki, Atsugi, JP;

Yuichi Yanagisawa, Atsugi, JP;

Naoto Goto, Tochigi, JP;

Shun Mashiro, Oyama, JP;

Assignee:

Semiconductor Energy Laboratory Co., Ltd., Atsugi, JP;

Attorney:

Fish & Richardson P.C.

Primary Examiner:

Eric W Jones

Int. Cl.
CPC ...
H10K 59/122 (2023.01); H10K 50/00 (2023.01); H10K 50/10 (2023.01); H10K 59/00 (2023.01); H10K 59/12 (2023.01); H10K 59/80 (2023.01); H10K 71/20 (2023.01);
U.S. Cl.
CPC ...
H10K 59/122 (2023.02); H10K 50/00 (2023.02); H10K 59/00 (2023.02); H10K 59/1201 (2023.02); H10K 71/233 (2023.02); H10K 50/10 (2023.02); H10K 59/871 (2023.02); H10K 59/8722 (2023.02); H10K 59/8731 (2023.02);
Abstract

A method of fabricating a display device with high resolution is provided. A display device having both high display quality and high resolution is provided. The method of fabricating a display device includes steps of forming a first EL film and a first sacrificial film over a first pixel electrode and a second pixel electrode; etching the first sacrificial film to form a first sacrificial layer; etching the first EL film to form a first EL layer and to expose the second pixel electrode; forming a second EL film and a second sacrificial film; etching the second sacrificial film to form a second sacrificial layer; etching the second EL film to form a second EL layer; forming an insulating film covering the first sacrificial layer, the first EL layer, the second sacrificial layer, and the second EL layer; and etching the insulating film to form an insulating layer including a region in contact with a side surface of the first EL layer and a region in contact with a side surface of the second EL layer.

Find Patent Forward Citations

Yamazaki, Shunpei. (2026). Method of fabricating display device using sacrificial film (U.S. Patent No. 12720961). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12720961

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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