The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2026

Filed:

May. 09, 2022
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Huimei Zhou, Albany, NY (US);

Baozhen Li, South Burlington, VT (US);

Chih-Chao Yang, Glenmont, NY (US);

Ashim Dutta, Clifton Park, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 1/47 (2025.01); H01C 17/06 (2006.01); H10W 20/40 (2026.01); H10W 20/42 (2026.01); H10W 20/47 (2026.01);
U.S. Cl.
CPC ...
H10D 1/474 (2025.01); H01C 17/06 (2013.01); H10W 20/42 (2026.01); H10W 20/47 (2026.01); H10W 20/498 (2026.01);
Abstract

Embodiments of present invention provide a resistor structure. The resistor structure includes a first layer of electrically insulating material; and a second layer of resistive material directly adjacent to the first layer, wherein thermal conductivity of the first layer is equal to or larger than 100 W/m/K. In one embodiment, the first layer of electrically insulating material has a band gap equal to or larger than 4 eV and is selected from a group consisting of aluminum-nitride (AlN), boron-nitride (BN), and diamond (C).


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