The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2026

Filed:

Oct. 11, 2022
Applicant:

Changxin Memory Technologies, Inc., Hefei City, CN;

Inventor:

Qinghua Han, Hefei City, CN;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10B 12/00 (2023.01); G11C 11/4096 (2006.01); H10D 30/01 (2025.01); H10D 30/40 (2025.01); H10D 64/27 (2025.01);
U.S. Cl.
CPC ...
H10B 12/48 (2023.02); G11C 11/4096 (2013.01); H10D 30/014 (2025.01); H10D 30/402 (2025.01); H10D 64/514 (2025.01);
Abstract

The disclosed semiconductor structure includes: a substrate and a data line on the substrate, the data line extends along a first direction; the first transistor and the second transistor located on the first transistor's side away from the data line; each of the first transistor and the second transistor includes: a semiconductor column, the semiconductor column is located on a part of the top surface of the data line and extends along the third direction; an isolation structure inside the semiconductor column; along the second direction, the thickness of the isolation structure in different regions in the third direction is different, and the isolation structure runs through the semiconductor columns, and two of the first, the second and the third directions intersect each other. This improves the sensitivity of the second transistor to the change in current in the first transistor while reducing the leakage current in the first transistor.


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