logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12716840 B1

PDFFull Text
Date of Patent:
Aug. 25, 2026

Filed:

Sep. 26, 2022

Measurement method and substrate processing apparatus

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Yuji Otsuki, Albany, NY (US);

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorneys:

Nath, Goldberg & Meyer

Jerald L. Meyer

Tanya E. Harkins

Primary Examiner:

Uzma Alam

Assistant Examiner:

Fani Polyzos Boosalis

Int. Cl.
CPC ...
G01N 21/552 (2014.01); C23C 16/52 (2006.01); G01N 21/3563 (2014.01); G01N 21/84 (2006.01); H10P 74/00 (2026.01);
U.S. Cl.
CPC ...
G01N 21/552 (2013.01); C23C 16/52 (2013.01); G01N 21/3563 (2013.01); G01N 21/8422 (2013.01); H10P 74/23 (2026.01); G01N 2021/3568 (2013.01); G01N 2021/8427 (2013.01); G01N 2201/0638 (2013.01);
Abstract

A measurement method includes: a first measurement step of irradiating a prism with infrared light and measuring reflected light totally reflected by the prism; a second measurement step of irradiating the prism with infrared light while the prism is arranged on a substrate and measuring reflected light totally reflected by a surface of the prism on the substrate; and a calculation step of calculating an absorbance spectrum from an intensity spectrum of infrared light for each wave number of the reflected light measured in the first measurement step and an intensity spectrum of infrared light for each wave number of the reflected light measured in the second measurement step.

Find Patent Forward Citations

Quick Actions:

Otsuki, Yuji. (2026). Measurement method and substrate processing apparatus (U.S. Patent No. 12716840). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12716840

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…