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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12716833 B1

PDFFull Text
Date of Patent:
Aug. 25, 2026

Filed:

Aug. 29, 2024

Spectrometric measurement method

Applicant:

Endress+hauser Optical Analysis, Inc., Ann Arbor, MI (US);

Inventors:

Patrick Ehlers, Mölnlycke, SE;

Randy Benedict, Ann Arbor, MI (US);

Florian Krogmann, Kreuzlingen, CH;

Joseph B. Slater, Dexter, MI (US);

Joel Patrow, Ann Arbor, MI (US);

Oliver Link, Gundelfingen, DE;

Jürgen Dessecker, Wittlingen, DE;

Assignee:

Endress+Hauser Optical Analysis, Inc., Ann Arbor, MI (US);

Attorneys:

Gil M. Repa

Endress+Hauser (USA) Holding, Inc.

Primary Examiner:

Hwa Andrew Lee

Int. Cl.
CPC ...
G01N 21/31 (2006.01); G01N 33/483 (2006.01); G06N 3/096 (2023.01);
U.S. Cl.
CPC ...
G01N 21/31 (2013.01); G01N 33/4833 (2013.01); G06N 3/096 (2023.01); G01N 2021/3196 (2013.01); G01N 2201/1293 (2013.01); G01N 2201/1296 (2013.01);
Abstract

A spectrometric measurement method of, in measurement situation(s) within a predetermined application, determining measurement results of measurand(s) of a medium of an application specific type, wherein each measurement situation is predetermined by specifying at least one influencing factor affecting measured spectra in the respective measurement situation, includes: based on universal training data, determining a universal model for determining predictions of each measurand; for each measurement situation, based on the universal model and supplementary training data including at least one supplementary spectrum determined in the respective measurement situation and corresponding supplementary value(s) of each measurand, determining a dedicated model for determining measurement results of each measurand in the respective measurement situation; and based on measured spectra determined in the respective measurement situation and the dedicated model, determining measurement results of each measurand of the medium.

Find Patent Forward Citations

Ehlers, Patrick. (2026). Spectrometric measurement method (U.S. Patent No. 12716833). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12716833

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