The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2026
Filed:
May. 20, 2021
Diamontech Ag, Berlin, DE;
Werner Mäntele, Kiefersfelden-Mühlbach, DE;
Thorsten Lubinski, Berlin, DE;
Sergius Janik, Berlin, DE;
Michael Kaluza, Berlin, DE;
DiaMonTech AG, Berlin, DE;
Abstract
A method of analyzing a material () comprising at least one analyte, said method comprising a material status analyzing procedure (), in which a present status of the material is analyzed, wherein based on a result of said material status analyzing procedure (), at least one of a selection of analyte-characteristic-wavelengths used during an analyte measurement procedure (), an absolute time or a relative time proportion of use of analyte-characteristic-wavelengths during said analyte measurement procedure (), an individual excitation radiation intensity, or a relative weight given to the wavelengths in the analysis, a selection of analyte-characteristic-wavelengths to be used simultaneously during said analyte measurement procedure (), and a selection of one or more main frequencies of the modulation of said excitation radiation () intensity to be used during said analyte measurement procedure () is determined.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile