The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2026

Filed:

Jul. 06, 2023
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Guan Jung Chen, Hsinchu, TW;

Shi-Ming Wang, Hsinchu, TW;

Chia-Hung Tsai, Hsinchu, TW;

Yuan-Yu Feng, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 9/035 (2006.01); B08B 5/04 (2006.01); H10P 72/00 (2026.01); H10P 72/10 (2026.01);
U.S. Cl.
CPC ...
H10P 72/1924 (2026.01); B08B 5/04 (2013.01); B08B 9/035 (2013.01); H10P 72/0604 (2026.01); H10P 72/1926 (2026.01);
Abstract

A method of cleaning a nozzle of a gas supply system includes loading an apparatus including a carrier and an automated nozzle cleaning system in the carrier onto a load port containing a gas supply system. The automated nozzle cleaning system includes a first nozzle cleaning device, a second nozzle cleaning device and a monitoring device, and the carrier is positioned to enable a gas inlet of the carrier to be connected to a nozzle of the gas supply system. The method also includes vacuuming contaminant particles from the nozzle using the first nozzle cleaning device, mechanically removing the contaminant particles adhering to the nozzle off the nozzle using the second nozzle cleaning device, and measuring a level of the contaminant particles using the monitoring device.


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