The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2026

Filed:

Nov. 25, 2020
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Dai Inagi, Kyoto, JP;

Tatsuya Shimano, Kyoto, JP;

Takashi Ota, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H10P 50/64 (2026.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
H10P 72/0604 (2026.01); H10P 50/642 (2026.01); H10P 72/0422 (2026.01); H10P 72/0616 (2026.01);
Abstract

A processing condition specifying method that includes Steps S, S, and S. In Step S, a prediction thickness information piece containing prediction values of thicknesses after processing on the substrate W is calculated for each of a plurality of recipe information pieces based on measurement thickness information containing measurement values of thicknesses of the substrate W. In Step S, the prediction thickness information pieces each calculated for a corresponding one of the recipe information pieces are evaluated according to a prescribed evaluation method and a prediction thickness information piece is selected from among the prediction thickness information pieces. In Step S, a recipe information piece corresponding to the selected prediction thickness information piece is specified. The measurement values contained in the measurement thickness information indicate a thickness of the substrate W measured before processing on the substrate W.


Find Patent Forward Citations

Inagi, Dai. (2026). Processing condition specifying method, substrate processing method, substrate product production method, computer program, storage medium, processing condition specifying device, and substrate processing apparatus (U.S. Patent No. 12707920). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12707920

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