The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2026
Filed:
Dec. 28, 2022
Applicant:
Semes Co., Ltd., Cheonan-si, KR;
Inventors:
Chan Yong An, Cheonan-si, KR;
Ja Myung Gu, Cheonan-si, KR;
Sang Moon Yoo, Hwaseong-si, KR;
Tae Hoon Jo, Seoul, KR;
Assignee:
Semes Co., LTD., Cheonan-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32155 (2013.01); H01J 37/32091 (2013.01); H01J 37/32642 (2013.01); H01J 37/32522 (2013.01); H01J 2237/334 (2013.01);
Abstract
The inventive concept provides a substrate processing apparatus. The substrate processing apparatus may include a chamber having an interior space, a support unit that supports a substrate in the interior space, a ring unit disposed on an edge region of the support unit when viewed from above, an impedance control unit electrically connected to the ring unit to control a flow or density of plasma in an edge region of the substrate and a filter unit disposed between the ring unit and the impedance control unit.