The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2026
Filed:
Mar. 15, 2023
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventor:
Takashi Yamauchi, Koshi City, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); H10P 72/30 (2026.01);
U.S. Cl.
CPC ...
G03F 7/0035 (2013.01); G03F 7/168 (2013.01); G03F 7/2041 (2013.01); H10P 72/3304 (2026.01);
Abstract
A substrate treatment method performs a treatment for forming a pattern of a metal-containing resist on a substrate. The method includes changing an acid concentration in a substrate existence space where the substrate exists in a substrate treatment apparatus before a developing treatment of a film of the metal-containing resist.
Yamauchi, Takashi. (2026). Substrate treatment method, storage medium, and substrate treatment apparatus (U.S. Patent No. 12704779). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12704779
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile