The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

G02B 21/00 (2006.01); G02B 21/06 (2006.01); G02B 21/24 (2006.01); G02B 21/36 (2006.01); G06T 7/00 (2017.01); G06T 7/73 (2017.01); H01J 37/21 (2006.01); H01J 37/26 (2006.01);

U.S. Cl.

CPC ...

G02B 21/365 (2013.01); G02B 21/06 (2013.01); G02B 21/241 (2013.01); G06T 7/0004 (2013.01); G06T 7/74 (2017.01); H01J 37/21 (2013.01); H01J 37/265 (2013.01); G06T 2207/10056 (2013.01); G06T 2207/30148 (2013.01);

Abstract

Regarding a microscope system, a technique capable of suitably achieving a focusing on a surface of a sample is provided. The microscope system includes an irradiation optical system (laser light sourceor the like) that irradiates a surface of a sampleon a stagewith light from an oblique direction, an observation optical system (cameraor the like) that forms an image of scattered light from the surface of the sample, a focus mechanism (piezo stageor the like) that changes a height position of focus with respect to the surface of the sample, and a computer systemthat acquires an image from the observation optical system. Regarding the sample, the computer system acquires a first image in a first focus state and a second image in a second focus state, in which the first image and the second image have different focus heights, calculates an amount of change between a position of a first spot pattern in the first image and a position of a second spot pattern in the second image, calculates an amount of change in height of the samplebased on an incident angle in the oblique direction and the amount of change in position of spot pattern, and adjusts the height position of the focus by using the amount of change in sample height so as to focus on the surface of the sample

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