The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2026
Filed:
Nov. 30, 2020
Ebara Corporation, Tokyo, JP;
Kyushu Institute of Technology, Fukuoka, JP;
Hisanori Matsuo, Tokyo, JP;
Keisuke Suzuki, Fukuoka, JP;
EBARA CORPORATION, Tokyo, JP;
Kyushu Institute of Technology, Fukuoka, JP;
Abstract
The present invention relates to a polishing apparatus and a polishing method for polishing a workpiece, such as a wafer on which a pattern is formed, on a polishing pad, and more particularly, relates to a polishing apparatus and a polishing method for detecting a geometric element of a pattern, such as a pitch. The polishing apparatus includes: a polishing table () configured to support a polishing pad (); a polishing head () configured to press a workpiece (W), having a pattern formed therein, against the polishing pad () and polish a surface of the workpiece (W), an imaging device () disposed in the polishing table () and configured to generate an image including at least the pattern of the workpiece (W), and an image analysis system () configured determining a geometric element of the pattern of the workpiece (W) based on the image.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile