The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2026
Filed:
Jul. 06, 2022
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Cheng-Chi Chuang, Hsinchu, TW;
Li-Zhen Yu, Hsinchu, TW;
Huan-Chieh Su, Hsinchu, TW;
Chun-Yuan Chen, Hsinchu, TW;
Lin-Yu Huang, Hsinchu, TW;
Chih-Hao Wang, Hsinchu, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Abstract
A device includes semiconductor device structure includes a first dielectric layer. A first plurality of nanostructures are disposed on the first dielectric layer, with the first plurality of nanostructures overlying one another. A first source/drain region is disposed laterally adjacent to a first side of the first plurality of nanostructures. A second dielectric layer is on a first side of the first source/drain region. A front side source/drain contact is disposed on a second side of the first source/drain region that is opposite the first side, and a backside source/drain contact is disposed on the first side of the first source/drain region. The backside source/drain contact extends through the second dielectric layer.