The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2026
Filed:
Oct. 02, 2023
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Shravana Kumar Katakam, Lehi, UT (US);
Ashim Dutta, Clifton Park, NY (US);
Chih-Chao Yang, Glenmont, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 1/00 (2025.01); H01G 4/012 (2006.01); H01G 4/08 (2006.01); H01G 4/33 (2006.01); H10D 1/68 (2025.01);
U.S. Cl.
CPC ...
H10D 1/043 (2025.01); H01G 4/012 (2013.01); H01G 4/085 (2013.01); H01G 4/33 (2013.01); H10D 1/042 (2025.01); H10D 1/714 (2025.01);
Abstract
A metal-insulator-metal (MIM) capacitor includes a dielectric layer forming a plane and a capacitor dielectric formed in a pattern having a width parallel to the plane and a height transverse to the plane. Electrodes are formed as sidewall spacers on opposite sides of the width of the capacitor dielectric. Each of the electrodes has a contact to make an electrical connection to the electrode, the contact being disposed within the height.