The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2026
Filed:
Jan. 11, 2024
Applied Materials Israel Ltd., Rehovot, IL;
Boaz Dudovich, Rehovot, IL;
Lev Koushnir, Rehovot, IL;
Applied Materials Israel Ltd., Rehovot, IL;
Abstract
A method for training a machine learning process, the method includes obtaining signatures of substrate patterns of a training related substrate; finding first signatures of reference patterns that are similar to the signatures of the substrate patterns, the reference patterns are associated with defects previously defined as defects of interest, the finding is executed regardless of one or more parameters that impact a generation of the first reference signatures; populating a defects of interest dataset with second signatures of the reference patterns that convey more information about the defects previously defined as defects of interest than the first signatures of the reference patterns; populating another dataset with additional signatures; and training, in a supervised manner, the machine learning process to find defects of interest, wherein the training includes feeding the defects of interest dataset and the other dataset to the machine learning process.