The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2026
Filed:
Jul. 13, 2020
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Kumiko Hayashi, Annaka, JP;
Kyoko Soga, Annaka, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/075 (2006.01); G03F 7/004 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0757 (2013.01); G03F 7/0045 (2013.01); G03F 7/32 (2013.01); G03F 7/38 (2013.01);
Abstract
The coating formed from the photosensitive resin composition has excellent resolution and improved microprocessing properties, as well as satisfactory reliability in terms of adhesion and crack resistance, resolution, and flexibility. The photosensitive resin composition includes (A) a polymer including a silicone skeleton and (B) photo-acid generators, wherein the photo-acid generators (B) comprise (B1) a photo-acid generator which is an onium salt and (B2) a photo-acid generator which is not an onium salt.