The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2026

Filed:

Oct. 22, 2021
Applicant:

Ebara Corporation, Tokyo, JP;

Inventor:

Yu Ishii, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/32 (2012.01);
U.S. Cl.
CPC ...
B24B 37/32 (2013.01);
Abstract

A retainer is disposed around a holding regionof a polygonal substrate WF in a top ring for holding the polygonal substrate WF with a surface to be polished facing downward. The retainerincludes a plurality of retainer main bodiesdisposed around the holding regionindependently along respective sides of the polygonal substrate WF. At least one of the plurality of retainer main bodiesincludes a first securing surface (first surface), a first opposed surface (second surface), a second securing surface (third surface), and a second opposed surface (fourth surface). The first securing surface is securable to a retainer holding memberof the top ring, the first opposed surface is opposed to the holding regionin a first state where the first securing surface is secured to the retainer holding member, the second securing surface is securable to the retainer holding memberin a second state where the retainer main bodyis rotated by 180 degrees from the first state, and the second opposed surface is opposed to the holding regionin a state where the second securing surface is secured to the retainer holding member


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